Customer
Success
Porting Success at Every
Major Process Node
Since its founding
IN2FAB has worked with its customers and achieved porting success at every
major process node from 0.35 microns down to and including silicon success at
45 nanometers. The company has performed
in excess of 100 migration tapeout projects for customers covering a wide
expanse of end application types.
Additionally IN2FAB’s customers do not just demand process porting
services for CMOS but also for BiCMOS and SiGe.
IN2FAB’s OSIRIS technology and methodology used in conjunction with
expert knowledge of IN2FAB’s engineers in high speed design well into the RF
band has yielded successful full chip level migrations.
IN2FAB is currently working with some of its advanced customers requiring
migration of IP to the 32nm and 28nm process geometries.