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0.25 Micron Migration Case Studies

ZFx86 Chip – 486 based application chip

US Fabless Vendor

US Fabless VendorUS Fabless Vendor

Type of chip/IP

  • 486 core with north bridge and south bridge, I/O, ESD and bond pad structures


Business Goals

  • Migrate entire ZFx86 chip from National Semiconductor foundry due to end of life to IBM foundry
  • Working design at earliest possible date due to limited inventory to meet customer demand
  • Achieve working first time silicon and minimum yield targets


Source Process

  • NSC cmos8 0.25µm


Target Process

  • IBM CMOS6RF 0.25µm


Project Cycle time

  • 6 calendar weeks for migration with a further 5 months in chip validation, OS and application testing


Results

  • Currently in production
  • Loaded BIOS and ran OS first time

 

Cell Library, Multiple Cells
US IDM


Type of chip/IP

  • 453 cells for internal foundry


Business Goals

  • Achieve early availability of cell library (developed for internal foundry) in TSMC 0.25µm process to support a range of application specific customer developments
  • Support fab-lite strategy
  • Use trusted external resources due to lack of internal resources
  • Secure design-in wins through fast cycle time enabled by migration approach


Source Process

  • Internal 0.25µm


Target Process

  • TSMC CL025G 0.25µm


Size of die/IP pre migration

  • Various


Size of die/IP post migration

  • Same


Project Cycle time

  • 5 calendar weeks for porting of layout and schematics to target process


Results

  • Used in current development projects
  • In volume production with various chips

 

Application Specific Analog Mixed Signal IP Core
US IDM

 

Type of chip/IP

  • Application specific analog mixed signal IP core


Business Goals

  • Achieve fast cycle time to support customer market window
  • Achieve optimal design shrink
  • Enable fab-lite strategy through porting internal IP to TSMC foundry
  • Minimize impact to internal resources


Source Process

  • Internal 0.6µm


Target Process

  • TSMC CL025G 0.25µm

 

Size of die/IP pre migration

  • Various


Size of die/IP post migration

  • 0.5x linear shrink


Project Cycle time

  • 5 calendar weeks for porting of layout and schematics to target process


Results

  • IP successfully ported and signed off by customer

 

Porting Case Studies
Migration to 0.35µm

Cordless Chip
Europe based design group of a US Fabless Vendor

 

Type of chip/IP

  • 2.4GHz Cordless chip with bond wire inductors


Business Goals

  • Achieve early availability of qualified analog mixed signal modules used widely across the corporation in 90nm process node to support various SoC development programs


Source Process

  • CSM 0.6µm BiCMOS


Target Process

  • Jazz Semiconductor SBC35QTX 0.35µm SiGe


Size of die/IP pre migration

  • 2880µm x 2765µm; 2239µm x 1585µm (IF block)


Size of die/IP post migration

  • 0.75x linear shrink (2160µm x 2073µm; 1679µm x 1300µm)


Project Cycle time

  • 9 calendar weeks for porting of layout


Results

  • Ported silicon worked first time
  • Achieved volume production
  • Migrated design used for subsequent derivative products


Commercial Wireless Chip
Europe based design group of a US IDM

Type of chip/IP

  • 2.4GHz commercial wireless chip containing significant RF, analog and digital block

 

Business Goals

  • Foundry end of life for process line necessitated that the chip had to be migrated to company’s internal foundry process
  • Achieve migration of the design with minimal disruption to existing engineering resources which were bandwidth constrained
  • Fast migration to enable qualification and customer switch over at earliest possible time


Source Process

  • ST 0.5µm BiCMOS

 

Target Process

  • Internal 0.35µm BiCMOS


Size of die/IP pre migration

  • Confidential


Size of die/IP post migration

  • Confidential 


Project Cycle time

  • 8 calendar weeks for porting of layout


Results

  • Ported silicon worked first time
  • Achieved volume production

 

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